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Focus on investment and development layout of semiconductor wet process equipment industry

Fully realize the domestic substitution of semiconductor wet process equipment

SINGLE WAFER CLEANER（SC3100 SERIES）

Applications

RCA cleaning,GATE cleaning,oxide etching and removal,photoresist stripping

Wafer size

300mm

Application of Wet Cleaning Processes

Particle removal
Metal contamination removal
Organic contamination removal
Photoresist stripping
Pre-cleaning and Post-cleaning
Oxide etching and removal
Al interconnect cleaning
Cu interconnect cleaning

Features&configurations

● WPH:300
● 8 chambers
● 4 FOUP
● Chemicals(Ex):DHF,SC1,SC2,DIO3,DICO2,IPA
● Backside Protection:Option,3ea nozzles
● Heating control,concentration control,flow rate control,pressure control et al.
● SECS/GEM communication

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